The scia Batch 350 is designed for homogeneous biocompatible coatings of various 3-dimensional-shaped substrates in one batch. Its stable and reproducible process meets the high quality standards for treatment of medical objects.
Principle:
The scia Batch 350 uses an RF parallel plate arrangement with rotation of each substrate for a homogeneous coating of all sides. The system is also available with an additional DC bias applied to the substrate holder.
scia Batch 350
Application:
3-dimensional barrier coating of biocompatible films for medical implants (pacemakers, stents)
Stent for vascular intervention, PRO-Kinetic Energy © BIOTRONIK
Features and Benefits:
- Carrier loading system that allows for batch coating of various 3D substrate sizes
- Two independent RF electrodes for high throughput
- Homogeneous “all-around coating” by individual rotation of each substrate
- Superior barrier performance and fully cohesive film, also during mechanical deformation
- Combination of in-situ heating, plasma pre-treatment and PECVD coating
- Flexible gas and RF parameters
Technical Specifications:
| SPECIFICATION | DESCRIPTION |
|---|---|
| Substrate size | Carrier size up to 350 mm x 240 mm Individual sizes loaded on 2 carriers |
| Substrate carrier | Water-cooled, pulsed DC bias (2 kV, 400 mA) |
| Plasma source | RF parallel plate arrangement, 13.56 MHz |
| Power supply | RF power Max: 2 x 600 W |
| Electrode setup and modes | Temperature: heating up to 400 °C Distance: adjustable between 50 mm and 150 mm Modes: Independent or coupled |
| Typical deposition rate | SiC: 5 nm/min |
| Base pressure | < 5 x 10-7 mbar |
| System dimension (W x D x H) | 0.90m x 1.70m x 2.10m (without electrical rack and pumps) |
| Configurations | Single chamber with manual loading in batches |
| Software interfaces | SECS II / GEM, OPC |