scia Systems GmbH

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scia Systems was founded 2013 and is located in Chemnitz, Germany. The company manufactures advanced ion beam and plasma processing equipment for the production of microelectronics, MEMS and precision optical components, in both high volume production as well as R&D applications.  scia Systems provides highly reliable tools together with outstanding technology support.  The systems accommodate all standard wafer sizes and may be customized to handle samples in a wide range of sizes.  The tools are flexible and modular in design, allowing several vacuum process chambers to be combined into cluster or in-line solutions, according to customer-specific requirements.


Ion Beam Etching (IBE) Systems:

scia Mill 150

for full surface etching of substrates up to 150 mm

scia Mill 200

for full surface etching of wafers up to 200 mm

scia Mill 300

for full surface etching of wafers up to 300 mm

Ion Beam Trimming (IBT) Systems:

scia Trim 200

for localized trimming, polishing, and planarization for wafers up to 200mm

scia Finish 1500

for polishing error correction on substrates up to 1500mm


Magnetron Sputtering Systems:

scia Magna 200

for wafer coatings of up to 200mm

scia Multi 300

for uniform multilayer deposition of wafers up to 300mm diameter

scia Multi 680

for multilayer coatings of large substrates up to 680mm

scia Multi 1500

for multilayer coatings of substrates up to 1500mm

Ion Beam Sputtering (IBS) Systems:

scia Coat 200

for high quality multilayer deposition of substrates up to 200mm

scia Coat 500

for large area multilayer deposition of substrates up to
500mm x 300mm

scia Opto 300

for high precision optical coatings of substrates up to
300mm diameter


PECVD/RIE Systems:

scia Batch 350

PECVD system for 3D coatings in batches

scia Cube 300

PECVD or RIE system for large area coating or etching of substrates over 300mm x 200mm

scia Cube 750

PECVD or RIE system for large area coating or etching of substrates over 750mm x 750mm

Dry-Cleaning Systems:

scia Clean 800

for high-quality cleaning and qualification of substrates up to 800mm dia. & 500mm height

scia Clean 1000/1500/3000

for high-quality cleaning and qualification of substrates up to 3m dia. and 3.4m length


Electron Beam Evaporation Systems:

scia Eva 200

for glancing angle deposition for precise nanostructures on wafers up to 200mm

Custom-Made Systems:

Custom-Made System

Customized system for your needs in various configurations.

scia Inline 400

for shaping and coating of high-quality razor blade tips