The scia Clean 800, 1000/1500/3000 systems are used for dry-cleaning of 3-dimensional shaped substrates with weights up to 14 tons. The chamber design and functionality ensures a very good base pressure and allows to quantify even small residual contaminations on the substrate by mass spectroscopy measurement.
Principle:
scia Clean 800
scia Clean 1000 / 1500 / 3000
The clean systems are capable of removing contaminates from 3-D substrates by using ultra-high vacuum desorption. Optional chamber or substrate heating provides further thermal desorption, and can be coupled with plasma treatment.
Features and Benefits:
ALL scia Clean 800 / 1000 / 1500 / 3000:
- Low base pressure and fast pumping due to electropolished and heated vacuum chamber
- Separate substrate heating for improved desorption
- Qualification of residual contamination by high-sensitive mass spectroscopy
- Recipes for repeatable temperature ramps and fully automated cleaning cycles
- Optional plasma source(s) for advanced cleaning with H2 plasma
scia Clean 800 ONLY:
- Crane for loading of large and heavy substrates
scia Clean 1000 / 1500 / 3000 ONLY:
- Transfer system for loading of heavy substrates
Applications:
- Ultra-high purity cleaning of X-ray optics
- Cleaning of components for beam line accelerators
- Outgassing qualification of complex vacuum assemblies
Technical Specifications:
| Clean 800 | Clean 1000 | Clean 1500 | Clean 3000 | |
|---|---|---|---|---|
| Substrate size (up to) | Diameter: 800mm Height: 500mm Weight: 500kg | Diameter: 1000mm Length: 850mm Weight: 500kg | Diameter: 1500mm Length: 1700mm Weight: 2t | Diameter: 3000mm Length: 3400mm Weight: 14t |
| Substrate heating | Radiation heaters (4.5 kW): up to 250 °C | Radiation heaters (7.5 kW): up to 250 °C | Radiation heaters (20 kW): up to 250 °C | Radiation heaters (40 kW): up to 250 °C |
| Chamber heating and cooling | Pressurized water based heating: up to 150°C and cooling (8 kW) | Pressurized water based heating: up to 150°C and cooling (16 kW) | Pressurized water based heating: up to 150°C and cooling (48 kW) | Pressurized water based heating: up to 150°C and cooling (96 kW) |
| Plasma sources | Optional: ICP plasma source (PI400), max. 2.5 kW | Optional: Up to 2 ICP plasma source (PI400), max. 2.5 kW | Optional: Up to 10 ICP plasma source (PI400), max. 2.5 kW | Optional: Up to 12 ICP plasma source (PI400), max. 2.5 kW |
| Base pressure | < 5 x 10-9 mbar | < 5 x 10-9 mbar | < 5 x 10-8 mbar | < 5 x 10-8 mbar |
| Quality control | Mass spectrometer for quantitative outgassing measurement | Mass spectrometer for quantitative outgassing measurement | Mass spectrometer for quantitative outgassing measurement | Mass spectrometer for quantitative outgassing measurement |
| System dimension (W x D x H) | 1.30m x 2.50 m x 1.40m (without electrical rack and pumps) | 1.60m x 1.80m x 2.70m (without electrical rack and pumps) | 8.00m x 4.20m x 3.60m (without electrical rack and pumps) | 15.00m x 5.50m x 4.80m (with electrical rack and pumps) |
| Configurations | Single chamber with top lid Optional: crane for loading of heavy substrates | Single chamber with front door, manual loading with transport wagon | Single chamber with front door, loading via transfer system with transport carriers | Single chamber with front door, loading via transfer system with transport carriers |
| Software interfaces | SECS II / GEM, OPC | SECS II / GEM, OPC | SECS II / GEM, OPC | SECS II / GEM, OPC |